Wells Fargo 8th Annual TMT Summit
Logotype for KLA Corporation

KLA (KLAC) Wells Fargo 8th Annual TMT Summit summary

Event summary combining transcript, slides, and related documents.

Logotype for KLA Corporation

Wells Fargo 8th Annual TMT Summit summary

12 Jan, 2026

China export controls and business impact

  • New U.S. export controls for China are expected to reduce 2025 revenue by about $500 million, with a 70/30 split between systems and services.

  • Overall China business is projected to decline in the low 20% range year-over-year, with revenue mix shifting from around 40% to the high 20s percentile.

  • Licensing inefficiencies and supply constraints could affect the final impact, but guidance for the December quarter remains unchanged.

  • Pull-ins from 2026 and more efficient licensing could mitigate some of the negative effects.

  • Further updates will be provided at the next earnings call.

Industry trends and growth drivers

  • Leading-edge investments, especially the N2 node and high bandwidth memory, are driving significant business growth into 2025.

  • Advanced packaging revenue is expected to grow from $300 million in 2023 to over $750 million in 2025.

  • Long-term industry growth is seen as end-market driven, with semiconductor revenue growth projected above 7%.

  • Capital intensity is rising, favoring process control, especially in logic and foundry segments.

  • Process control markets where the company is strong are growing faster than the overall market.

Technology and product positioning

  • The shift to two-nanometer (N2) gate-all-around architecture increases process control intensity and market share.

  • More design starts at N2 compared to previous nodes, driven by high-performance computing and power efficiency.

  • High bandwidth memory and advanced packaging require higher sampling rates and more complex inspection, boosting demand.

  • Reticle inspection demand is stable but expected to grow faster than the overall market due to increased design activity.

  • Less reuse in process control at N2, with expectations for N2 to be the largest node in design starts.

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